In NSG (Next-Generation Sequencing) applications, an adhesion layer is required for immobilizing DNA within a high-density array. However, the application of an amine binding layer used for capturing DNA needs to be compatible with the photoresist pattern. Having too much amine present results in photoresist reticulation and also increases the non-specific binding resulting in poorer detection.
IST and our customer were able to develop a process with superior uniform coverage by lowering the amine concentrations using a controlled Dose of precursor during the deposition process. This results in a controlled density of reactive sites over the capture device.