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RPX-210: Benchtop Silanation for R&D and Small Volume Production
The RPX-210 system is extremely compact and is intended to fit on a bench top workstation with a remote facility box to supply additional facilities. The RPX-210 system is ideal for silanation reactions on bio-consumables or wafers. With IST’s Vaporrix cartridges and chemistry can exchange in as little as 15 minutes.
20-liter chamber (Capacity Reference: one 200mm Wafer Cassette).
2 Liquid precursors.
2 Gas sources (O2, N2, or Ar).
100W Plasma Source.
Solid Block Aluminum chamber. Corrosion Proof.
Superior Thermal Uniformity.
CE Mark.
Applications
Adhesion Promoters
BioMEMS
Glassware
MEMS
Typical Industries
Genomics Research
Optics
R&D / Educational
Semiconductors
Sensors
Process Technologies
Plasma Surface Activation
Silanation
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