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RPX-210: Benchtop Silanation for R&D and Small Volume Production

The RPX-210 system is extremely compact and is intended to fit on a bench top workstation with a remote facility box to supply additional facilities. The RPX-210 system is ideal for silanation reactions on bio-consumables or wafers. With IST’s Vaporrix cartridges and chemistry can exchange in as little as 15 minutes.

  • 20-liter chamber (Capacity Reference: one 200mm Wafer Cassette).

  • 2 Liquid precursors.

  • 2 Gas sources (O2, N2, or Ar).

  • 100W Plasma Source.

  • Solid Block Aluminum chamber. Corrosion Proof.

  • Superior Thermal Uniformity.

  • CE Mark.

Applications


Adhesion Promoters
BioMEMS
Glassware
MEMS

Typical Industries


Genomics Research
Optics
R&D / Educational
Semiconductors
Sensors

Process Technologies


Plasma Surface Activation
Silanation

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