Atomic Layer Deposition:

Atomic layer deposition (ALD) is a thin film deposition technique that is based on the sequential use of gas phase chemical processes. ALD typically uses two chemicals referred to as precursors, which react with the surface of a material one at a time in a sequential and self-limiting manner. Through the repeated exposure to separate precursors, a thin film is deposited. The ALD technique is the basic synthesis of many nanomaterials.

IST’s process equipment enables the use of multiple precursors to enable the combine ALD with other surface modification chemicals to create nano-composite / multi-layer structures in one tool set. The benefit is a superior quality film since the entire process is created in-situ.

 

IST’s Repellix film is an example of an engineered super-hydrophobic + oleophobic film that is applied to commercial hearing aids to reduce corrosion, moisture and ear-wax ingress. 

Contact Information

Address:
Menlo Park, California 94025

Phone: (650) 324-1824
E-Mail: information@insurftech.com

Dropwise Condensation Dynamics